Material Preparation and Characterization

Full access is available to the following facilities through VCU’s Nano Characterization Center (NCC) user facility:

  • Hitachi SU-70 cold field emission SEM with EDS and electron beam lithography system.

  • JEOL JSM 5610-LV SEM with Oxford EDS.

  • Veeco IKONtm AFM system (used for both AFM and MFM studies).

  • ESCAlab 250 X-ray photoelectron spectrometer.

  • Anton Parr SAXSESS small angle x-ray scattering system.

  • PANalytical XRD system

  • Zeiss Libra 120 TEM

  • Quantum Design Versalab VSM

  • Various DC and RF sputtering systems

  • Temperature variable Atomic and Magnetic Force Microscope

  • Atomic Layer Deposition

  • MRC 603 Sputtering System

  • Dual E-beam/Thermal Evaporator

  • Environment controlled glove boxes

  • Spin coaters and other sample preparation facilities

  • Dynacool, 9 tesla magnetometer with heat capacity, transport and magnetooptical options

  • Tube furnace with high vacuum system

  • S-1160 Probe station

  • Hot isostatic press 

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