Material Preparation and Characterization
Full access is available to the following facilities through VCU’s Nano Characterization Center (NCC) user facility:
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Hitachi SU-70 cold field emission SEM with EDS and electron beam lithography system.
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JEOL JSM 5610-LV SEM with Oxford EDS.
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Veeco IKONtm AFM system (used for both AFM and MFM studies).
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ESCAlab 250 X-ray photoelectron spectrometer.
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Anton Parr SAXSESS small angle x-ray scattering system.
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PANalytical XRD system
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Zeiss Libra 120 TEM
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Quantum Design Versalab VSM
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Various DC and RF sputtering systems
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Temperature variable Atomic and Magnetic Force Microscope
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Atomic Layer Deposition
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MRC 603 Sputtering System
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Dual E-beam/Thermal Evaporator
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Environment controlled glove boxes
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Spin coaters and other sample preparation facilities
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Dynacool, 9 tesla magnetometer with heat capacity, transport and magnetooptical options
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Tube furnace with high vacuum system
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S-1160 Probe station
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Hot isostatic press




