Material Preparation and Characterization

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Full access is available to the following facilities through VCU’s Nano Characterization Center (NCC) user facility:

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• Hitachi SU-70 cold field emission SEM with EDS and electron beam lithography system.

• JEOL JSM 5610-LV SEM with Oxford EDS.

• Veeco IKONtm AFM system (used for both AFM and MFM studies).

• ESCAlab 250 X-ray photoelectron spectrometer.

• Anton Parr SAXSESS small angle x-ray scattering system.

• PANalytical XRD system

• Zeiss Libra 120 TEM

• Quantum Design Versalab VSM

• Various DC and RF sputtering systems

• Temperature variable Atomic and Magnetic Force Microscope

• Atomic Layer Deposition

• MRC 603 Sputtering System

• Dual E-beam/Thermal Evaporator

• Environment controlled glove boxes

• Spin coaters and other sample preparation facilities

• Dynacool, 9 tesla magnetometer with heat capacity, transport and magnetooptical options

• Tube furnace with high vacuum system

• S-1160 Probe station

• Hot isostatic press 

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